|
1
|
DMAL2SH153922
|
PRECISION MACHINED POLYESTER ENGINEERING PLASTIC COMPONENT FOR SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30408 PRECISION MACHINED, SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30164
|
ITW RIPPEY
|
SHANGHAI GOLD FREQUENT
|
2018-12-03
|
China
|
471 Kgs
|
28 BOX
|
|
2
|
DMAL2SH144979
|
PRECISION MACHINED POLYESTER ENGINEERING PLASTIC COMPONENT FOR SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30408 PRECISION MACHINED, SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30164
|
ITW RIPPEY
|
SHANGHAI GOLD FREQUENT
|
2018-10-31
|
China
|
471 Kgs
|
28 BOX
|
|
3
|
DMAL2SH138911
|
PRECISION MACHINED POLYESTER ENGINEERING PLASTIC COMPONENT FOR SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30408 PRECISION MACHINED, POLYESTER ENGINEERING PLASTIC COMPONENT FOR SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30185
|
ITW RIPPEY
|
SHANGHAI GOLD FREQUENT
|
2018-10-14
|
China
|
435 Kgs
|
25 BOX
|
|
4
|
DMAL2SH123682
|
PRECISION MACHINED POLYESTER ENGINEERING PLASTIC COMPONENT FOR SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30408 PRECISION MACHINED, POLYESTER ENGINEERING PLASTIC COMPONENT FOR SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30185
|
ITW RIPPEY
|
SHANGHAI GOLD FREQUENT
|
2018-09-06
|
China
|
435 Kgs
|
25 BOX
|
|
5
|
DMAL2SH117993
|
PRECISION MACHINED POLYESTER ENGINEERING PLASTIC COMPONENT FOR SEMICONDUCTOR MANUFACTURE WAFER CLEANING TOOL, C-30408
|
ITW RIPPEY
|
SHANGHAI GOLD FREQUENT
|
2018-08-17
|
China
|
360 Kgs
|
20 BOX
|