|
1
|
DMALTYOA05215
|
SINGLE WAFER CLEANING SYSTEM
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-08-18
|
Japan
|
15100 Kgs
|
8 CAS
|
|
2
|
DMALTYOA04812
|
SINGLE WAFER CLEANING SYSTEMMODEL : SU-3800(S/N : 530800245A)
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-08-08
|
Japan
|
15910 Kgs
|
24 CAS
|
|
3
|
DMALTYOA04303
|
SINGLE WAFER CLEANING SYSTEMMODEL:SU-3200(S/N:530N01130A)
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-07-22
|
Japan
|
13380 Kgs
|
6 CAS
|
|
4
|
DMALTYOA03899
|
SINGLE WAFER CLEANING SYSTEMMODEL:SU-3200(S/N:530N01107A)
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-06-30
|
Japan
|
14360 Kgs
|
6 CAS
|
|
5
|
DMALTYOA03362
|
ANNEALING APPLICATION FOR SILICON WAFERS
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-06-19
|
Japan
|
13760 Kgs
|
9 CAS
|
|
6
|
DMALTYOA03353
|
SINGLE WAFER CLEANING SYSTEM
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-06-19
|
Japan
|
13740 Kgs
|
6 CAS
|
|
7
|
DMALTYOA02773
|
ANNEALING APPLICATION FOR SILICON WAFERS
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-06-02
|
Japan
|
15030 Kgs
|
11 CAS
|
|
8
|
DMALTYOA02203
|
SPIN SCRUBBERMODEL:SS-3200(S/N:530V00487A)
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-05-26
|
Japan
|
7290 Kgs
|
6 CAS
|
|
9
|
DMALTYOA02162
|
SINGLE WAFER CLEANING SYSTEMMODEL:SU-3200(S/N:530N01107A)
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-05-05
|
Japan
|
7450 Kgs
|
6 CAS
|
|
10
|
DMALTYOA01191
|
SINGLE WAFER CLEANING SYSTEMMODEL:SU-3200(S/N:530N01107A)
|
INTEL C/O RINCHEM
|
SCREEN SEMICONDUCTORS SOLUTIONS CO
|
2019-04-19
|
Japan
|
13490 Kgs
|
6 CAS
|