1
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KLLMJP1071990
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001 CVD EQUIPMENT S N:C11273F15 REUSE TRIAS (STTRK4TA00) TRIAS TIN (S N:C11273) . .
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MICRON TECHNOLOGY
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MICRON MEMORY JAPAN,G.K.(HIROSHIMA)
|
2021-02-15
|
Japan
|
8640 Kgs
|
9 CAS
|
2
|
KLLMJP1071531
|
002 CVD EQUIPMENT S N:C10403F15 REUSE TRIAS (STTRK2RF00) TRIAS TIN (S N:C10403) . .
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MICRON TECHNOLOGY
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MICRON MEMORY JAPAN,G.K.(HIROSHIMA)
|
2021-02-05
|
Japan
|
8430 Kgs
|
9 CAS
|
3
|
KLLMJP5042878
|
BROOKS - DIFFUSION ON-BOARD IS CRYO PUMP EDWARDS - MAGLEV TURBO MOLECULAR PUMP . HS CODE : 8414.10 .
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MICRON TECHNOLOGY VIRGINIA (MTV)
|
MICRON MEMORY JAPAN,G.K.(HIROSHIMA)
|
2020-09-09
|
Japan
|
900 Kgs
|
2 CAS
|
4
|
KLLMJP1067184
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WAFER ETCHING SYSTEM TEL_TELIUS-SDRM[3CH] . . . .
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MICRON TECHNOLOGY
|
MICRON MEMORY JAPAN G.K.(HIROSHIMA)
|
2020-08-08
|
Japan
|
10329 Kgs
|
11 CAS
|
5
|
KLLMJP1067196
|
IMPLANT EQUIPMENT, VIISTA HC EQUIPMENT S N:ES137161 IMHCK1Z400 . . .
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MICRON TECHNOLOGY
|
MICRON MEMORY JAPAN G.K.(HIROSHIMA)
|
2020-08-08
|
Japan
|
24980 Kgs
|
20 CAS
|
6
|
KLLMJP1067182
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IMPLANT EQUIPMENT, VIISTA HC EQUIPMENT S N ES137172 IMHCK1ZD00 . . .
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MICRON TECHNOLOGY
|
MICRON MEMORY JAPAN G.K.(HIROSHIMA)
|
2020-08-08
|
Japan
|
24670 Kgs
|
19 CAS
|
7
|
KLLMJP1067181
|
WAFER ETCHING SYSTEM TEL_TACTRAS-VESTA NV . . . .
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MICRON TECHNOLOGY VIRGINIA (MTV)
|
MICRON MEMORY JAPAN G.K.(HIROSHIMA)
|
2020-08-08
|
Japan
|
14088 Kgs
|
14 CAS
|
8
|
KLLMJP1067037
|
WAFER ETCHING SYSTEM TOOL RERIAL#408238 AMAT_G2 DPS2-CENTURA (2-1CH) . . .
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MICRON TECHNOLOGY
|
MICRON MEMORY JAPAN G.K.(HIROSHIMA)
|
2020-07-28
|
Japan
|
7045 Kgs
|
10 CAS
|
9
|
KLLMJP1067038
|
CHEMICAL MECHANICAL POLISHING EQUIPMENT EBARA F-REX300S . . .
|
MICRON TECHNOLOGY
|
MICRON MEMORY JAPAN G.K.(HIROSHIMA)
|
2020-07-28
|
Japan
|
14078 Kgs
|
7 CAS
|
10
|
KLLMJP1067040
|
WAFER ETCHING SYSTEM TOOL SERIAL#408529 AMAT_G2 DPS2-CENTURA (2-1CH) . . .
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MICRON TECHNOLOGY
|
MICRON MEMORY JAPAN G.K.(HIROSHIMA)
|
2020-07-28
|
Japan
|
7088 Kgs
|
10 CAS
|