1
|
NMCOPPLAX2104435
|
THERMAL QUILT 106PKGS=88PCS+18TOTES
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJIFILM ELECTRONIC MATERIAL
|
2021-05-18
|
China Taiwan
|
45218 Kgs
|
206 PKG
|
2
|
NYKSSINT18505700
|
HEXAMETHYLDISILAZANE
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJIFILM ELECTRONIC MATERIAL
|
2017-07-02
|
Singapore
|
1252 Kgs
|
28 PKG
|
3
|
NYKSSINT07726300
|
CANISTERS
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJIFILM ELECTRONIC MATERIAL
|
2017-04-14
|
Singapore
|
637 Kgs
|
22 DRM
|
4
|
CMDUSIJ0220876
|
VESSEL SAIL ON 05/02/17 - SUYIN PAYMENT RECEIVED - OCB365111 SGD475 / OCB000010 EMPTY DRUMS 8 CANISTERS HMDS (200L) RESIDUE LAST CONTAINED HEXAMETHYLDISILAZANE UN NO: 3286/IMCO: 3/ PACKAGING GROUP:II, FLASHPOINT: 15 C CHEMICAL NAME: HEXAMETHYLDISILAZANE
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJIFILM ELECTRONIC MATERIAL
|
2017-03-02
|
Hong Kong
|
2808 Kgs
|
18 PCS
|
5
|
NYKSSINT01921100
|
HEXAMETHYLDISILAZANE
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJIFILM ELECTRONIC MATERIAL
|
2017-02-18
|
Singapore
|
1181 Kgs
|
31 PKG
|
6
|
NYKSSINS16363100
|
HEXAMETHYLDISILAZANE
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJI FILM ELECTRONIC MATERIAL
|
2016-09-22
|
Singapore
|
576 Kgs
|
22 PKG
|
7
|
NYKSSINS13020200
|
PHOSPHORIC ACID
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJI FILM ELECTRONIC MATERIAL
|
2016-08-25
|
Singapore
|
512 Kgs
|
20 PKG
|
8
|
NYKSSINS10208700
|
PHOSPHORIC ACID, NITRIC ACID, ACETIC ACID
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJI FILM ELECTRONIC MATERIAL
|
2016-07-30
|
Singapore
|
622 Kgs
|
29 PKG
|
9
|
NYKSSINS06279600
|
HEXAMETHYLDISILAZANE
|
FUJIFILM ELECTRONICS MATERIALS
|
FUJI FILM ELECTRONIC MATERIAL
|
2016-07-01
|
Singapore
|
496 Kgs
|
21 DRM
|
10
|
NYKSSINS03108100
|
HEXAMETHYLDISILAZANE
|
FUJIFILM ELECTRONIC MATERIALS
|
FUJI FILM ELECTRONIC MATERIAL
|
2016-06-02
|
Singapore
|
1694 Kgs
|
36 PKG
|