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3
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HLCULIV100225350
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CORROSIVE LIQUIDCORROSIVE LIQUID, N.O.S.(PHOSPHORIC ACID, NITRIC ACID),UN1760, CLASS 8, PG II -RESIDUE CONTENT ONLYUN1760CORROSIVE LIQUID, N.O.S.(HYDROFLUORIC ACID), UN1760, CLASS8, PG III - RESIDUE CONTENT ONLYUN30921-METHOXY-2-PROPANOL, UN3092, CLASS3, PG III, F/P 36C - RESIDUECONTENT ONLYUN3264CORROSIVE LIQUID, ACIDIC,INORGANIC, N.O.S. (HYDROFLUORICACID), UN1760, CLASS 8, PG III -RESIDUE CONTENT ONLYUN1292TETRAETHYL SILICATE, UN1292, CLASS3, PG III - RESIDUE CONTENT ONLYUN1230METHANOL, UN1230, CLASS 3, SUB RISK6.1, PG II - RESIDUE CONTENT ONLYUN1292TETRAETHYL SILICATE, UN1292, CLASS3, PG III - FULL CONTENTUN1230METHANOL, UN1230, CLASS 3, SUB RISK6.1, PG II - FULL CONTENTPLASTIC LABWAREOF PLASTIC LABWARE - NON HAZARDOUS
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FUJIFILM ELECTRONIC MATERIALS USA
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BOG GASES IRELAND C/O
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2010-04-01
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Netherlands
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3780 Kgs
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83 PCS
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