1
|
MAEU229844131
|
MAA(METHACRYLIC ACID) PURITY: MIN 99.5%, INHIBITOR(MEHQ) : 250 +/- 20PPM
|
SAMSUNG C&T AMERICA, INC 105 CHALLE
|
LX MMA CORP. 23F, LG SEOUL STATION
|
2023-09-14
|
South Korea
|
20152 Kgs
|
1 CTN
|
2
|
MAEU229847437
|
MAA(METHACRYLIC ACID) PURITY: MIN 99.5%, INHIBITOR(MEHQ) : 250 +/- 20PPM
|
SAMSUNG C&T AMERICA, INC 105 CHALLE
|
LX MMA CORP. 23F, LG SEOUL STATION
|
2023-09-14
|
South Korea
|
20192 Kgs
|
1 CTN
|
3
|
MAEU229845009
|
MAA(METHACRYLIC ACID) PURITY: MIN 99.5%, INHIBITOR(MEHQ) : 250 +/- 20PPM
|
SAMSUNG C&T AMERICA, INC 105 CHALLE
|
LX MMA CORP. 23F, LG SEOUL STATION
|
2023-09-14
|
South Korea
|
20242 Kgs
|
1 CTN
|
4
|
MAEU229848256
|
N-BMA (NORMAL BUTYL METHACRYLA TE) PURITY:MIN 99.6%, INHIBI TOR(MEHQ) : 15 +/- 2 PPM
|
SAMSUNG C&T AMERICA, INC 105 CHALLE
|
LX MMA CORP. 23F, LG SEOUL STATION
|
2023-09-14
|
South Korea
|
20202 Kgs
|
1 CTN
|
5
|
MAEU229845320
|
MAA(METHACRYLIC ACID) PURITY: MIN 99.5%, INHIBITOR(MEHQ) : 250 +/- 20PPM
|
SAMSUNG C&T AMERICA, INC 105 CHALLE
|
LX MMA CORP. 23F, LG SEOUL STATION
|
2023-09-14
|
South Korea
|
20172 Kgs
|
1 CTN
|
6
|
MAEU229844467
|
MAA(METHACRYLIC ACID) PURITY: MIN 99.5%, INHIBITOR(MEHQ) : 250 +/- 20PPM
|
SAMSUNG C&T AMERICA, INC 105 CHALLE
|
LX MMA CORP. 23F, LG SEOUL STATION
|
2023-09-14
|
South Korea
|
20162 Kgs
|
1 CTN
|
7
|
MAEU229848035
|
MAA(METHACRYLIC ACID) PURITY: MIN 99.5%, INHIBITOR(MEHQ) : 250 +/- 20PPM
|
SAMSUNG C&T AMERICA, INC 105 CHALLE
|
LX MMA CORP. 23F, LG SEOUL STATION
|
2023-09-03
|
South Korea
|
20142 Kgs
|
1 CTN
|
8
|
MAEU229847830
|
MAA(METHACRYLIC ACID) PURITY: MIN 99.5%, INHIBITOR(MEHQ) : 250 +/- 20PPM
|
SAMSUNG C&T AMERICA, INC 105 CHALLE
|
LX MMA CORP. 23F, LG SEOUL STATION
|
2023-09-03
|
South Korea
|
20182 Kgs
|
1 CTN
|
9
|
SMLMSEL2K1096A01
|
EXPANDABLE POLYSTYRENE (EPS)
|
SAMSUNG C&T AMERICA INC. 105 CHALLE
|
SAMSUNG C AND T CORPORATION 123, OL
|
2022-10-23
|
South Korea
|
208952 Kgs
|
260 PKG
|